Mitigation of substrate coupling effects in RF switch by localized substrate removal using laser processing

BHASKAR, Arun; PHILIPPE, Justine; OKADA, Etienne; BRAUD, Flavie; Robillard, Jean-Francois; DURAND, Cédric; GIANESELLO, Frédéric; GLORIA, Daniel; GAQUIERE, Christophe; Dubois, Emmanuel

doi:10.36227/techrxiv.12901199.v1

Laser-processing-RF-switch-TechRxiv.pdf (895.18 kB)

Mitigation of substrate coupling effects in RF switch by localized substrate removal using laser processing

preprint

posted on 2020-09-09, 03:13 authored by Arun BHASKAR, Justine PHILIPPE, Etienne OKADA, Flavie BRAUD, Jean-Francois Robillard, Cédric DURAND, Frédéric GIANESELLO, Daniel GLORIA, Christophe GAQUIERE, Emmanuel DuboisEmmanuel Dubois

Mitigation of substrate coupling effects in RF switch by localized substrate removal using laser processing

History

Email Address of Submitting Author

emmanuel.dubois@iemn.fr

ORCID of Submitting Author

https://orcid.org/0000-0002-0347-010X

Submitting Author's Institution

IEMN-CNRS-UNIV-LILLE

Submitting Author's Country

France

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Keywords

RF/microwave circuits SOI Technology RF frontend T/R switch Substrate engineering Laser processing

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CC BY 4.0

Mitigation of substrate coupling effects in RF switch by localized substrate removal using laser processing

History

Email Address of Submitting Author

ORCID of Submitting Author

Submitting Author's Institution

Submitting Author's Country

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Keywords

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