Roadmap of Ferroelectric Memories: From Discovery to 3D Integration
The versatility of hafnium oxide-based ferroelectric memories to function as a storage class memory, a synaptic device for neuromorphic implementation, and a device capable of high-density integration have made them attractive candidates for next-generation technology. Ferroelectric memories have been increasingly popular with the discovery of ferroelectricity in hafnium oxide at a shallow thickness and compatibility with complementary metal-oxide-semiconductor-compatible processes. The single transistor-based ferroelectric cell makes them ideal for non-volatile embedded memory solutions, bridging the gap between on-chip SRAM and external data storage (e.g. Flash). This paper begins with discovering ferroelectricity in Rochelle salt and discusses the neoteric progress up to successful integration with 3D memory.
History
Email Address of Submitting Author
sourav.de@ipms.fraunhofer.deSubmitting Author's Institution
Fraunhofer-Institut für Photonische Mikrosysteme IPMS - Center Nanoelectronic Technologies (CNT)Submitting Author's Country
- Germany