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Patterning infrastructure development for advanced EUV lithography
  • Kurt Ronse
Kurt Ronse

Corresponding Author:[email protected]

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This article describes all the steps that need to be taken to develop a high volume manufacturing process for advanced EUV scanners. It covers EUV masks, EUV pellicles, EUV wafer materials such as EUV resists, underlayers,… Also the metrology needs are covered.